Advanced Process Control for PECVD Equipment Using Kalman Filter and Minimum Variance Controller

• Main Authors: Chao-An Lee, 李昭安
• Other Authors: An-Chen Lee
• Format: Others
• Language: zh-TW
• Published: 2008
• Online Access: http://ndltd.ncl.edu.tw/handle/21360849871474412621

碩士 === 國立交通大學 === 工學院碩士在職專班半導體材料與製程設備組 === 96 === This thesis proposes an advanced process controller which combines kalman filter and Minimum Variance Controller (MVC) to improve the process variance of Pad-Boron Silicon Glass (Pad-BSG) of Plasma Enhanced-Chemical Vapor Deposition (PE-CVD) process. Firstly, we use Design of Experiment (DOE) method to obtain the control factors which can affect the process characteristic. The control model’s parameters which can be updated by kalman filter every batch is established by non-linear multi-regression. The recipe of PE-CVD process is generated by MVC finally. This thesis presents the performance of an advanced process controller in simulation with historical process data and experiment it on PE-CVD process in 8-inch fabrication. The experiment results show that the process variance converges fast and stably to the target value; moreover, the stability of process is also increased.