LPCVD BTBAS Silicon Nitride thin film for 65nm Transistor Sidewall Spacer Application
碩士 === 國立交通大學 === 工學院碩士在職專班半導體材料與製程設備組 === 96 === As the dimension of semiconductor device keep shrinking to nanometer generation, in order to achieve specific transistor performance and channel length, the manufacture of silicon nitride thin film which is used for sidewall spacer application is fac...
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| Format: | Others |
| Language: | zh-TW |
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2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/71537317714553414736 |