A study of proximity effect in E-beam lithography
碩士 === 國立交通大學 === 電機學院微電子奈米科技產業專班 === 96 === In this thesis, proximity effect of E-beam lithography was investigated, including proximity effect parameters and proximity effect correction. An E-beam simulation program based on Monte Carlo method was developed to obtain proximity effect parameters. B...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/66606222665172220132 |