| Summary: | 碩士 === 國立中央大學 === 光電科學研究所 === 96 === In this research, titanium oxide (TiO2) thin films were fabricated by DC reactive magnetron sputtering with titanium target at room temperature. Ion assisted deposition (IAD) was also conducted during the thin film deposition. The working gas was argon and oxygen, and the substrates were glass and Poly Ethylene Terephthalate (PET).
The optical properties, surface roughness and stress of the film were discussed with different sputtering and IAD power. The sputtering power was varied from 1.5 to 2 kW, and IAD power was varied from 24 to 56 W. The average transmittance of the fabricated TiO2 thin films was 91% on both glass and PET substrates.
The deposition rate, refractive index and surface roughness were increased as the function of sputtering power. The trend of thin film stress on glass and PET tended to compressive as sputtering power increased, and reached a maximum value of -509MPa on PET at 2kW.
In the case of argon IAD, the refractive index of TiO2 thin film increased as the function of ion current. However, the variation of surface roughness and stress of the film was not obvious in this case.
We figured out that the refractive index of TiO2 thin film was increased using oxygen IAD. Nevertheless, the etching effect on PET substrate by oxygen ion caused higher roughness and reduction of transmittance. The samples also deformed after the deposition process.
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