Studies on the influence of the annealing chamber pressure for the dopant diffusion and recrystalline of P-implanted Si(111) using reflective second harmonic generation
碩士 === 國立嘉義大學 === 光電暨固態電子研究所 === 96 ===
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| Language: | zh-TW |
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2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/2gpsz3 |