Studies on the influence of the annealing chamber pressure for the dopant diffusion and recrystalline of P-implanted Si(111) using reflective second harmonic generation
碩士 === 國立嘉義大學 === 光電暨固態電子研究所 === 96 ===
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2008
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ndltd-TW-096NCYU56140092019-05-15T19:28:45Z http://ndltd.ncl.edu.tw/handle/2gpsz3 Studies on the influence of the annealing chamber pressure for the dopant diffusion and recrystalline of P-implanted Si(111) using reflective second harmonic generation 利用反射式二次諧波研究磷佈植之矽晶片在不同退火腔壓力的擴散與再結晶 劉家銘 碩士 國立嘉義大學 光電暨固態電子研究所 96 羅光耀 2008 學位論文 ; thesis zh-TW |
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zh-TW |
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碩士 === 國立嘉義大學 === 光電暨固態電子研究所 === 96 ===
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羅光耀 |
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羅光耀 劉家銘 |
author |
劉家銘 |
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劉家銘 Studies on the influence of the annealing chamber pressure for the dopant diffusion and recrystalline of P-implanted Si(111) using reflective second harmonic generation |
author_sort |
劉家銘 |
title |
Studies on the influence of the annealing chamber pressure for the dopant diffusion and recrystalline of P-implanted Si(111) using reflective second harmonic generation |
title_short |
Studies on the influence of the annealing chamber pressure for the dopant diffusion and recrystalline of P-implanted Si(111) using reflective second harmonic generation |
title_full |
Studies on the influence of the annealing chamber pressure for the dopant diffusion and recrystalline of P-implanted Si(111) using reflective second harmonic generation |
title_fullStr |
Studies on the influence of the annealing chamber pressure for the dopant diffusion and recrystalline of P-implanted Si(111) using reflective second harmonic generation |
title_full_unstemmed |
Studies on the influence of the annealing chamber pressure for the dopant diffusion and recrystalline of P-implanted Si(111) using reflective second harmonic generation |
title_sort |
studies on the influence of the annealing chamber pressure for the dopant diffusion and recrystalline of p-implanted si(111) using reflective second harmonic generation |
publishDate |
2008 |
url |
http://ndltd.ncl.edu.tw/handle/2gpsz3 |
work_keys_str_mv |
AT liújiāmíng studiesontheinfluenceoftheannealingchamberpressureforthedopantdiffusionandrecrystallineofpimplantedsi111usingreflectivesecondharmonicgeneration AT liújiāmíng lìyòngfǎnshèshìèrcìxiébōyánjiūlínbùzhízhīxìjīngpiànzàibùtóngtuìhuǒqiāngyālìdekuòsànyǔzàijiéjīng |
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1719091291034222592 |