Investigation of applying stack High-K tunneling oxide and high work function metal gate to charge-trapping Flash Memory
碩士 === 國立清華大學 === 工程與系統科學系 === 96 ===
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/29013239477817569121 |