Two Degrees of Freedom Micromirror Fabrication by Using Multilayer High Aspect Ratio Metal Process
碩士 === 國立清華大學 === 微機電工程研究所 === 96 === Multilayer high-aspect-ratio metal technology consists of several conventional semiconductor fabrication techniques, including the photolithography process, micro-electroplating process and chemical mechanical polishing (CMP) process. Compared to bulk micromachi...
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/67112368901985836301 |