Characteristics of Metal-Nitride-Semiconductor Light Emitting Diode Made on PECVD Grown Si-rich SiNx Film with Si Nanocrystals
碩士 === 國立臺灣大學 === 光電工程學研究所 === 96 === In this thesis, we study optoelectrical characteristics and material analysis of silicon-rich silicon nitride film (SRSN) with silicon nanocrystals (Si-ncs). The SRSN films are deposited by plasma enhanced chemical vapor deposition (PECVD) using SiH4 and N2 or...
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| Format: | Others |
| Language: | zh-TW |
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2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/09586176079456825153 |