Characteristics of Si nanodots with Al2O3 and ZnO films deposited by atomic layer depositionand the applications on optoelectronic devices

碩士 === 國立臺灣大學 === 材料科學與工程學研究所 === 96 === Abstract This thesis presents the optical characteristics of the Si nanodots together with of Al2O3 and ZnO thin films deposited by atomic layer deposition (ALD). This thesis is divided into five topics. The first topic investigated the carrier traps in Si na...

Full description

Bibliographic Details
Main Authors: Fu-Hsiang Su, 蘇富祥
Other Authors: Miin-Jang Chen
Format: Others
Language:en_US
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/41395171438718649979