Characteristics of Si nanodots with Al2O3 and ZnO films deposited by atomic layer depositionand the applications on optoelectronic devices
碩士 === 國立臺灣大學 === 材料科學與工程學研究所 === 96 === Abstract This thesis presents the optical characteristics of the Si nanodots together with of Al2O3 and ZnO thin films deposited by atomic layer deposition (ALD). This thesis is divided into five topics. The first topic investigated the carrier traps in Si na...
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| Format: | Others |
| Language: | en_US |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/41395171438718649979 |