Strain on SiGe/Si Heterostructure and Patterned Nanostructures
博士 === 國立臺灣大學 === 電子工程學研究所 === 96 === The thesis is focused on the strain relaxation of two kinds of SiGe/Si strucutures: one is the common SiGe virtual substrate, and the other is the strain-induced SiGe wrinkling pattern. SiGe virtual substrate is widely used to provide strain into overgrown l...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2008
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/29579331705858875680 |