Abbe-SVD: Compact Abbe’s Kernel Generation for Microlithography Aerial Image Simulation using Singular-Value Decomposition Method

碩士 === 國立臺灣大學 === 電子工程學研究所 === 96 === At the present days, the key and critical part of industrial IC manufacture is the optical lithography technology which can duplicate the design patterns on the mask onto wafer by light exposure. However, when the mask patterns are too small which are approachin...

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Bibliographic Details
Main Authors: Tse-Yu Chiang, 江則佑
Other Authors: Chung - Ping Chen
Format: Others
Language:en_US
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/17771551777073303525