Simulation Study of Bulk FinFET and Ge Quantum Well pFET

碩士 === 國立臺灣大學 === 電機工程學研究所 === 96 === Bulk FinFET has advantages of heat dissipation, wafer cost, process compatibility and extendibility of conventional planar MOSFET technologies. The combination of recess channel array transistors (RCAT) technology and triple-gate in bulk silicon prove excellent...

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Bibliographic Details
Main Authors: Hung-Chih Chang, 張弘志
Other Authors: Chee-Wee Liu
Format: Others
Language:en_US
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/81706112428487610698