Design and fabrication of MEMS-based field emission electron emitters for multiple e-beam lithography
碩士 === 國立臺灣大學 === 機械工程學研究所 === 96 === Currently, the lithography which has critical dimension small than 45nm and can be applied to industry is not presented. However, single beam e-beam lithography has been developed for years. If the disadvantage of low throughput can be overcome by extending sing...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/04743677576497131720 |