Study of annealing effects on the properties of ZnO thin films deposited by ion beam sputtering deposition

碩士 === 國立臺灣科技大學 === 電子工程系 === 96 === ZnO thin films were deposited on (100) silicon substrates by capillaritron ion beam sputtering deposition. ZnO thin films were annealed in oxygen, nitrogen and in atmospheric condition at various temperatures. Effects of annealing on the properties of ZnO thin...

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Bibliographic Details
Main Authors: Dong-yi Tsai, 蔡東逸
Other Authors: Liang-chiun Chao
Format: Others
Language:zh-TW
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/80882874603039853425