The Study of the HfO2 Thin Film Deposition by Excimer Laser Sputtering and Its Photoelectric Characterization and Application of MIS Photodetector

碩士 === 國立高雄大學 === 電機工程學系--先進電子構裝技術產業研發碩 === 96 ===  In this thesis, we have demonstrated the deposition of HfO2 thin film on Si(100) by Excimer laser sputtering, and the characterization of optical and dielectric properties in Metal-Insulation-Semiconductor(MIS) devcie structure.  The fabrication of...

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Bibliographic Details
Main Authors: Zun-Sheng Lin, 林尊聖
Other Authors: Ming Chang Shih
Format: Others
Language:zh-TW
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/71718485277488133983