The Study of the HfO2 Thin Film Deposition by Excimer Laser Sputtering and Its Photoelectric Characterization and Application of MIS Photodetector
碩士 === 國立高雄大學 === 電機工程學系--先進電子構裝技術產業研發碩 === 96 === In this thesis, we have demonstrated the deposition of HfO2 thin film on Si（100） by Excimer laser sputtering, and the characterization of optical and dielectric properties in Metal-Insulation-Semiconductor（MIS） devcie structure. The fabrication of...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/71718485277488133983 |