PROCESS WINDOW AND OPC RULES FOR 32 NM NODE WITH 1.3 NA IMMERSION LITHOGRAPHY SYSTEM
碩士 === 南台科技大學 === 電子工程系 === 96 === This thesis discusses the feasibility of 32 nm node with 1.3 NA and 193 nm light source immersion lithography system and tries to extend the lifetime of the system. We present the process window and some typical OPC rules by numerical simulation with open software...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/68565777250786976346 |