Removal of Inorganic Gas Contaminant by Air-Washer in Make-up Air Units in Cleanrooms
碩士 === 國立臺北科技大學 === 能源與冷凍空調工程系碩士班 === 96 === The micro-contamination has been shifted to Airborne Molecular Contaminants (AMCs) caused by smaller pitch of wafer manufacturing process requested by semi-conductor industries. The AMCs generated in the cleanroom can be removed by chemical filter install...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/dp9972 |