PLASMA TREATMENT AND SILICON COATING TO IMPROVE THE FIELD EMISSION PROPERTIES OF CARBON NANOTUBES
碩士 === 大同大學 === 光電工程研究所 === 96 === This research has four parts, first we use the DC sputtering apparatus to deposit catalytic metal film on Silicon substrate, and then use thermal chemical vapor deposition(CVD) for the growth of carbon nanotubes(CNTs). Then the specimen was moved into the sputterin...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/03693507327789895294 |