The Study of Microcrystalline Silicon Thin Films at Low Temperature and its Application to Thin Film Transistors
碩士 === 大同大學 === 光電工程研究所 === 96 === In this thesis, microcrystalline silicon films are deposited at low temperature (110~300℃) from silane, highly diluted in hydrogen-argon mixtures. Argon addition during the deposition allows to increasing the crystallinity. Based on the experimental results, it is...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/66081369269137284982 |