Atomic-Level Stress Calculation and Investigation of Thin Film Deposition Process Using Molecular Dynamics Simulation
博士 === 雲林科技大學 === 工程科技研究所博士班 === 96 === Molecular dynamics is employed to investigate the film growth at different deposition conditions of incident energy, substrate temperature, incident angle, and deposition rate. The Morse two-body potential and the Second-Moment Approximation of the Tight-Bindi...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/79657869301147525643 |