An improved extraction method of the parasitic source/drain resistance for MOSFET''s

碩士 === 雲林科技大學 === 光學電子工程研究所 === 96 === Pocket implant structure of MOSFET’s improves some short-channel effects, but it also has disadvantages. For short channel devices, the drain current degradation is more related to parasitic source/drain resistance obviously. Therefore, the parameters of parasi...

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Bibliographic Details
Main Authors: Ying-Chieh Cheng, 鄭楹潔
Other Authors: none
Format: Others
Language:zh-TW
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/97143521288894416342