The Study of Fabrication of Microstructured Surface on Glass by Plasma Etching Method
碩士 === 中華大學 === 機械工程學系碩士班 === 97 === The glass plates with patterned structure on the surface have great potential for MEMS, opto-electrical and biomedical applications. It is difficult to produce micro/nano-pattern on glass material by traditional machining process. The aim of this research is to f...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/44231330764842898321 |
| Summary: | 碩士 === 中華大學 === 機械工程學系碩士班 === 97 === The glass plates with patterned structure on the surface have great potential for MEMS, opto-electrical and biomedical applications. It is difficult to produce micro/nano-pattern on glass material by traditional machining process. The aim of this research is to fabricate micro-pattern on Pyrex glass and fused silica material by plasma etching process using SF6, O2 and Ar/H2 as the reactive gas. The effects of gas flow ratio and processing parameters on the surface morphology and roughness of etched pattern are investigated.
The results show that the addition of Ar effectively enhances the chemical reaction of F and O radical with Pyrex glass, which favors the etching rate. The Al-F based film was found to be formed on the etched surface because the F ions interact with Al ions releasing from the chamber wall, which dominates the etching mechanisms of Pyrex glass. The surface roughness of etched Pyrex glass is not satisfied due to unable to effectively remove Al-F based compounds. The plasma etched fused silica presents good surface smoothness using SF6 and O2 as the reaction gases. There have no Al-F based compounds appearing on the etched surface. The etching depth of 870 nm can be achieved after a 120 minutes plasma etching treatment with the SF6/O2 gas flow rate of 28/2 sccm.
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