Simulation of Punch Through Effect in Non-overlapped Implantation nMOSFETs
碩士 === 中原大學 === 電子工程研究所 === 97 === Memory development is an important indicator of the semiconductor industry. The process and performance improvement are always challenging topics. Non-Volatile Memories (NVMs) have been developed for decades, and received much attention in mobile and portable appli...
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| Format: | Others |
| Language: | zh-TW |
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2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/69628461824900403891 |