The comparative study of Chemical Mechanical Polishing Wastewater Treatment Technologies for Semiconductor Industry
碩士 === 弘光科技大學 === 環境工程研究所 === 97 === Chemical mechanical polishing (CMP) wastewater of semiconductor industry by wafer surface planarization process is highly polluted. Because the CMP slurry contains nano particles and many kinds of organic or inorganic compounds, so the wastewater become complex a...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/64220069807098823555 |