The Study of the Effect of Silicon Film Thickness on the Crystallinity and Electric Properties in Aluminum Induced Crystallization Method
碩士 === 崑山科技大學 === 機械工程研究所 === 97 === In this study, we analyze the effect of amorphous silicon (a-Si) film thickness on the poly-crystalline silicon quality in the aluminum induced crystalization process. Amorphous silicon was deposited on the oxided Si wafer by plasma enhanced chemical vapor deposi...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/s9kzp7 |