High efficiency a-Si:H thin film solar cell deposited by HF-PECVD
碩士 === 明道大學 === 材料科學與工程學系碩士班 === 97 === The high frequency plasma enhanced chemical vapor deposition (HF-PECVD) is a well applicable deposition technique for large area and high rate deposition for silicon solar cell application. This paper presents the properties of a-Si:H films and high efficiency...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/49633829159140187911 |