The influence of n-type a-Si:H layers on the performance of a-Si:H thin film solar cells
碩士 === 國立中興大學 === 光電工程研究所 === 97 === In this thesis, a 13.56 MHz plasma-enhanced chemical vapor deposition with a pulse modulation RF power is used to fabricate n-type hydrogenated amorphous (a-Si:H) silicon thin films. The experiments are divided into two parts: (1) single-layer deposition and (2)...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/36589402995815511678 |