Interfacial and optical properties of iron silicide nanostructures on silicon substrates
碩士 === 國立中興大學 === 材料科學與工程學系所 === 97 === Iron silicide nanoparticles were grown on Si substrate by reactive deposition epitaxy at various temperatures. Fe thin films, 2 and 5 nm in thickness, were deposited on n-type and p-type Si substrates at 500-700 °C and were further annealed in situ at the same...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/54837491737336004735 |