Investigation of ion beam sputter deposited BST/TiAlN thin film
博士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 97 === Barium strontium titanate [(Ba,Sr)TiO3] (BST) has been shown to be a suitable dielectric layer in thin film capacitors, whilst TiAlN is a strong candidate for the barrier layer material. Thin films may be deposited using ion beam sputter deposition (IBSD)....
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/81085310163464166096 |