A Study on High-k, Photosensitive Gate Dielectrics for Organic Thin-film Transistors and Circuit Application

碩士 === 國立成功大學 === 電機工程學系碩博士班 === 97 === This study consists of four parts. In the first part, we intend to fabricate high-k, photosensitive dielectrics. First of all, we attempt to discover the best blending proportion of the photosensitive agent ADC to PVA for fabricating organic polymer dielectric...

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Bibliographic Details
Main Authors: SHU-HAO HSU, 許書豪
Other Authors: Wen-Hsi Lee
Format: Others
Language:zh-TW
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/17030296686056611864