Study of Aluminum Nitride Thin Film for SAW-RFID Applications
碩士 === 國立暨南國際大學 === 電機工程學系 === 96 === In this thesis, aluminum nitride (AlN) thin films have been deposited by pulsed DC reactive magnetron sputtering. The AlN film was deposited with the different N2 gas flow and on the various substrate structures such as SiO2 / Si, MO / SiO2 / Si, and Pt / SiO2 /...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/05199029121418564256 |