Nanometer Technology Cell Migration Considering Redundant Contact/Via and Topology Preservation

碩士 === 國立交通大學 === 資訊科學與工程研究所 === 97 === To avoid wasting man power and design time, layout migration plays an important role in the re-design of a cell library and full-custom block. Traditional layout migration suffers the disadvantage of shape distortion of objects and destruction to topology betw...

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Bibliographic Details
Main Authors: Chien-Liang Tsai, 蔡建樑
Other Authors: Yih-Lang Li
Format: Others
Language:en_US
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/85801634595858973256