Investigation of interfacial defects in Ⅲ-nitride

博士 === 國立交通大學 === 電子物理系所 === 97 === The interfacial defects properties of GaN-based Schottky diodes have been investigated and fabricated by utilized current voltage temperature (I-V-T) and capacitance-frequency (C-f) methods. Surface states effects of metal-semiconductor-metal (MSM) photodetectors...

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Bibliographic Details
Main Authors: Huang, Kuo-Chin, 黃國欽
Other Authors: Huang, Kai Feng
Format: Others
Language:en_US
Online Access:http://ndltd.ncl.edu.tw/handle/18485446726389059870