Chemical mechanical polish of freestanding GaN substrate
碩士 === 國立交通大學 === 電子物理系所 === 97 === In this work , the relation between the process of polish and the micro-roughness on the surface of GaN substrate was the purpose we studied. The major purpose of this study is to develop the process of fabricating the GaN substrate suitable for epitaxial purpose...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/98872916440894399223 |