RANDOM-DOPANT-INDUCED CHARACTERISTIC VARIABILITY IN NANOSCALE CMOS LOGIC CIRCUITS

碩士 === 國立交通大學 === 電信工程系所 === 97 === With the continuous scaling of the semiconductor device dimension, modeling of device variability has become crucial for the accuracy of timing in circuits and systems. Unfortunately, due to the randomness of discrete dopant position in device, the fluctuations of...

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Bibliographic Details
Main Authors: Ta-Ching Yeh, 葉大慶
Other Authors: Yiming Li
Format: Others
Language:en_US
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/77978933683815878395