The Influence of Microstructures of Electroless Co(W,P) and Ni(P)

碩士 === 國立交通大學 === 工學院半導體材料與製程產業專班 === 97 === This work studies the diffusion barrier properties of electroless Co(W,P) and Ni(P) layers to lead-free SnAgCu or eutectic PbSn solder so as to explore their applicability to under bump metallurgy (UBM) for flip-chip Cu-ICs. First, Co(W,P) or Ni(P) layers...

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Bibliographic Details
Main Authors: Huang, Nu-Han, 黃努涵
Other Authors: Hsieh, Tsung-Eong
Format: Others
Language:zh-TW
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/41067404709758718450