Investigation of dilute Ammonia hydrogen Peroxide Mixtures (APM) cleaning process in Deep Trench DRAM
碩士 === 國立交通大學 === 工學院碩士在職專班半導體材料與製程設備組 === 97 === In this thesis, clean solution of dulite APM（Ammonia (NH4OH ) and hydrogen Peroxide(H2O2) Mixtures）was evaluted to DT（Deep Trench）layer 、STI（Shallow Trench Isolation）layer of standard deep trench type DRAM（Dynamic Random Access Memory）and p-type bare...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/23110791167895298415 |