Investigation of dilute Ammonia hydrogen Peroxide Mixtures (APM) cleaning process in Deep Trench DRAM

碩士 === 國立交通大學 === 工學院碩士在職專班半導體材料與製程設備組 === 97 === In this thesis, clean solution of dulite APM(Ammonia (NH4OH ) and hydrogen Peroxide(H2O2) Mixtures)was evaluted to DT(Deep Trench)layer 、STI(Shallow Trench Isolation)layer of standard deep trench type DRAM(Dynamic Random Access Memory)and p-type bare...

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Bibliographic Details
Main Authors: Lee, Kuo-Chih, 李國智
Other Authors: Wu, sermon
Format: Others
Language:zh-TW
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/23110791167895298415

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