Using a-Si:H and a-SiGe:H Thin-Films Deposited with Hydrogen and Argon Dilution Technique To Improve Performances of Amorphous Silicon Based Solar Cells
碩士 === 國立中央大學 === 電機工程研究所 === 97 === In this thesis, the hydrogen and argon dilution technique was employed to deposit the a-Si:H and a-SiGe:H films with better optoelectronic characteristics, and then these thin-films were used to improve the photovoltaic parameters of amorphous silicon based solar...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/zy894y |