A study of Interferometric Ellipsometer for Measuring the Thickness of SiO2 Thin Film on Si Substrate
碩士 === 南開科技大學 === 電機與資訊工程研究所 === 97 === In this thesis, we employ a linearly polarized light to study the thickness of SiO2 thin film that deposed on the Si substrate. We analyse the phase difference and the amplitude ratio between the orthogonal polarized components of the beam that obliquely refle...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/10440312520840256214 |