Study of Microstructure and Photoelectrical Properties for Micro and Nanocrystalline Silicon Thin Film Prepared by HDPCVD at Room Temperature

碩士 === 國立屏東科技大學 === 材料工程所 === 97 === In this study, the micro- and nanocrystalline silicon thin films prepared by the high density plasma chemical vapor deposition, can be used to improve the electric property of the thin film transistors and solar cell devices. This experiment is designed by the di...

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Bibliographic Details
Main Authors: Tzu-I Chuang, 莊子誼
Other Authors: Ru-Yuan Yang
Format: Others
Language:zh-TW
Online Access:http://ndltd.ncl.edu.tw/handle/76133750505317804833