Study of Microstructure and Photoelectrical Properties for Microcrystalline Silicon Thin Film Prepared by HDP-CVD

碩士 === 國立屏東科技大學 === 材料工程所 === 97 === In this study, the microcrystalline silicon thin films prepared by the high density plasma chemical vapor deposition, can be used to improve the electric property for application in the thin film transistors and solar cell devices. This experiment is designed by...

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Bibliographic Details
Main Authors: Wei-Hsio Chen, 陳偉修
Other Authors: Ru-Yuan Yang
Format: Others
Language:zh-TW
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/18788144668568838993