Effect of various interfacial SiO2 layer on the properties of wafer direct bonding

碩士 === 國立清華大學 === 材料科學工程學系 === 97 ===   The technology of wafer direct bonding has been employed in present study to bond several types of silicon bonded wafer pairs with various interfacial SiO2 layers, such as: a silicon wafer with a surface native oxide layer bonded to another silicon wafer with...

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Bibliographic Details
Main Authors: Huang, Li-Yang, 黃立陽
Other Authors: Hu, Chen-Ti
Format: Others
Language:zh-TW
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/30069515584580804129