The Investigation of Metal-Gate/High-k CMOSFETs、Metal-Insulator-Metal Capacitor and MONOS Non-Volatile Memory Applying High-k Dielectric Materials
博士 === 國立清華大學 === 電子工程研究所 === 97 === According to International Technology Roadmap for Semiconductor (ITRS), logic and memory devices are being continuously scaled down to reduce the area of the chip and the cost. However, traditional dielectric material SiO2 will face the physical limitation of nan...
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| Format: | Others |
| Language: | en_US |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/67231215372915219498 |