Process Study for MOS Devices with Molybdenum and Tungsten Based High Work Function Metal Gates

碩士 === 國立清華大學 === 工程與系統科學系 === 97 ===

Bibliographic Details
Main Authors: Tseng, Yen-Ling, 曾彥霖
Other Authors: Chang-Liao, Kuei-Shu
Format: Others
Language:zh-TW
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/77522814210925998522