Fabrication of Micron and Submicron Compound Structures by Combining Interference Lithography and Nanoimprint Lithography
碩士 === 國立臺灣大學 === 光電工程學研究所 === 97 === It has been reported that the two dimensional sub-wavelength periodic structures would result in excellent broadband anti-reflection with wide incident angles. Though this technique is not widely used to replace traditional thin film coating presently, it is ex-...
Main Authors: | Hsin-Chieh Chiu, 邱信傑 |
---|---|
Other Authors: | Lon A. Wang |
Format: | Others |
Language: | en_US |
Published: |
2009
|
Online Access: | http://ndltd.ncl.edu.tw/handle/15234171222560412024 |
Similar Items
-
Fabrication of Metallic Nanostructure by Nanoimprint Lithography
by: Li, Chin, et al.
Published: (2016) -
Fabrication of Nano-Array Structure by Using Nanoimprint Lithography
by: Kai-Yuan Chi, et al.
Published: (2007) -
The study of the Nanoimprint Lithography
by: Jen-Fu Liu, et al.
Published: (2004) -
Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography
by: Juergen Brugger, et al.
Published: (2013-10-01) -
Extreme ultraviolet interferometric lithography - fabrication of transmission grating by using nanoimprint lithography
by: Yi-MingLin, et al.
Published: (2011)