Using Advanced Lithography to Prepare Nanostructured Materials with the Capability of Tuning Optical Wavelength

博士 === 國立臺灣大學 === 材料科學與工程學研究所 === 97 === In this thesis, the advanced lithography technology of nanoimprint, reversal nanoimprint and nanoshpere lithography are applied to fabricate patterns on functional materials, including ferroelectric materials, metal nanoparticles and carbon nanotubes (CNTs)....

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Bibliographic Details
Main Authors: Kun-Che Hsieh, 謝坤哲
Other Authors: 陳學禮
Format: Others
Language:en_US
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/45807711655887418184